In-line XPS metrology for area selective deposition processes on patterned structures

Metrology, Inspection, and Process Control XL 2026

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Authors: Manasa Medikonda, Linda W. Wangoh, Christopher J. Lee, Mark Klare, Dmitry Kislitsyn, H. Pois, Paul K. Isbester, Aron J. Cepler, Wei Ti Lee, Daniel F. Schmidt
DOI: 10.1117/12.3091149
Cited by: 1

Fields of Study & Subjects

Electron and X-Ray Spectroscopy Techniques Optical Coatings and Gratings Surface Roughness and Optical Measurements

Publication details

Journal / source
Metrology, Inspection, and Process Control XL
Publisher
SPIE
Pages
35–35
Publication date
8 April 2026