Nanoimprint lithography progress in manufacturing and integration

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Authors: Ryo Nawata, Noriyasu Hasegawa, Kenji Yamamoto, Kiyohito Yamamoto, Masayuki Kagawa, Mitsuru Hiura, Keita Sakai, Yukio Takabayashi
Cited by: 1

Fields of Study & Subjects

Nanofabrication and Lithography Techniques Advancements in Photolithography Techniques Block Copolymer Self-Assembly

Publication details

Journal / source
Novel Patterning Technologies 2026
Publisher
SPIE
Pages
19–19
Publication date
8 April 2026