Processing technology for large-sized high-efficiency liquid crystal components

Large-diameter passive diffractive liquid-crystal (LC) optical elements are highly promising for applications in large-aperture imaging, non-line-of-sight imaging, and optical communications due to their lightweight and high efficiency. Traditional fabrication relies on multiple spin-coating steps, which complicates precise control of the LC layer thickness and makes diffraction efficiency strongly thickness-dependent. At one hundred millimeters scales, conventional processing can also introduce coating voids and nonuniformities, adversely affecting device quality and yield. Here, we present a processing approach that integrates with the existing LC-device fabrication workflow to address these issues. The method eliminates spin-coating related void defects at 100mm scales, substantially improves uniformity, and enables nanometer-scale precision in LC thickness control. Consequently, the LC diffractive devices achieve diffraction efficiencies approaching the theoretical limit at the design wavelength. This work provides a simple, scalable fabrication route for large-size, high-diffraction LC devices, enhances device quality and yield, and offers a viable pathway toward mass production of large-diameter LC diffractive optics.