Towards a 1000W-compatible EUV pellicle (Erratum)
Abstract
This paper, originally published on 20 November 2024, was replaced with a corrected/revised version on 9 January 2026. The revised paper includes an acknowledgment of IMEC in figure 5, and addition of a reference: [22]. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance. Download the erratum for additional details.
Fields of Study & Subjects
Advancements in Photolithography Techniques
Optical Coatings and Gratings
Advanced X-ray Imaging Techniques
Publication details
- Journal / source
- SPIE Photomask Technology Conference
- Pages
- 200–200
- Publication date
- 9 January 2026