Antiferroelectric hafnia down to the 2D limit

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Authors: Xin Li, Guodong Ren, Haidong Lu, Kartik Samanta, Amit Kumar Shah, Kai Huang, Pravan Omprakash, Yu Yun, Pratyush Buragohain, Huibo B. Cao, Yan Wu, Jordan A. Hachtel
+7 more Andrew R. Lupini, Miaofang Chi, Juan Carlos Idrobo, Evgeny Y. Tsymbal, Alexei L. Gruverman, Rohan Mishra, Xiaoshan Xu
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Abstract

Antiferroelectricity is a material property characterized by alternating electric dipoles spontaneously ordered in antiparallel directions. Antiferroelectrics are promising for energy storage, solid-state cooling, and memory technologies; however, these materials are scarce, and their scalability remains largely unexplored. In this work, we demonstrate that single-crystalline hafnia, a lead-free CMOS-compatible material, exhibits antiferroelectricity under compressive-strain conditions. We observe antiparallel sublattice polarization and stable double-hysteresis in single-crystalline (111)-oriented epitaxial La-doped hafnia films grown on yttrium-stabilized zirconia and show that the antipolar orthorhombic phase of hafnia adheres to the Kittel model of antiferroelectricity. Notably, compressive strain strengthens the orthorhombic order in thinner La-doped hafnia films, achieving a very high ordering temperature of 850°C in the two-dimensional limit, highlighting hafnia’s potential for advanced antiferroelectric devices.

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices Semiconductor materials and interfaces

Publication details

Journal / source
Science
Publication date
24 September 2026
Language
EN