VLS Grating for X-Ray Optics as Fabricated by e-Beam Nanolithography with Optically Confirmed Exponential Line-Density Variation
Abstract
We report the development of a large-area plane Varied Line-Space grating with line density varying exponentially along the grating surface roughly from 160 to 560 mm –1 . The grating was produced using e-beam lithography with original square-stamp beam profile and is intended for an innovative high-resolution single-component grazing-incidence monochromator, in which wavelength scanning is achieved simply by linear movement of the grating along its surface. For a grating width of 60 mm, the first-order operating spectral range is 9–20 nm. Optical measurements of the line density-versus-coordinate dependence reveal perfect match between the fabricated and intended by the design density dependences.
Fields of Study & Subjects
Advancements in Photolithography Techniques
Advanced X-ray Imaging Techniques
Optical Coatings and Gratings
Publication details
- Journal / source
- Journal of Experimental and Theoretical Physics Letters
- Volume
- 123
- Issue
- 5
- Pages
- 367–373
- Publication date
- 24 February 2026
- Language
- EN