IMPACT OF HEATING/COOLING RATE ON THE POST-DEPOSITION ANNEALING OF LLZO THIN FILMS

This study reports the deposition of garnet-structured lithium lanthanum zirconate (LLZO) thin films using radio frequency (RF) sputtering on glass substrates by varying the heating/cooling rate. Deposition was carried out at a sputtering power of 70 W for 30 min under Ar environment. As-deposited films were annealed at 500°C at different heating/cooling rates (1.5, 6 and [Formula: see text]C/min). It was observed that these films were amorphous in nature and no crystalline phase was reported despite the change in heating/cooling rates. Thickness and compositions of these films were estimated using Rutherford backscattering spectroscopy (RBS) measurements. Thicknesses of as-deposited films were 110[Formula: see text]nm and reduced to 90[Formula: see text]nm on annealing at different heating/cooling rates, suggesting intermixing at the interface. This intermixing phenomenon, observed at the interfaces of the LLZO thin film, suggests potential interactions or diffusion processes during the annealing process.