On the Proposed Mechanism of Transpassive Film Formation in Pure Ni in Sulfate Environment: Insights from In Situ Raman Spectroscopy and Respirometry

Journal of The Electrochemical Society 2026

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Authors: Karthikeyan Hariharan, Koushik Kosanam, Carina Götz, Mark Bruns, Thomas Böhm, Philippe Marcus, narasi sridhar, Sannakaisa Virtanen
DOI: 10.1149/1945-7111/ae3b17
Cited by: 3
References: 34

Abstract

A mechanism for transpassive film formation in pure Ni in a sulfate environment is proposed based on in situ Raman spectroscopy and electrochemistry-coupled respirometry. Based on potentiostatic respirometry on pure Ni in 0.1 M K 2 SO 4 , there is a characteristic time-delay before the onset of oxygen evolution, coinciding with the onset of transpassive film formation upon stepping the potential from passive into the transpassive regime. At the same time, in situ Raman spectroscopy revealed that the transpassive film comprised of NiOOH. It reduced back without any time-delay after returning to open-circuit conditions to a passive Ni(OH) 2.

Fields of Study & Subjects

Electrodeposition and Electroless Coatings Electrocatalysts for Energy Conversion Copper-based nanomaterials and applications

Publication details

Journal / source
Journal of The Electrochemical Society
Publisher
The Electrochemical Society
Volume
173
Issue
3
Pages
031501–031501
Publication date
20 January 2026