An Integrated Approach to Fabricate, Visualize, and Analyze Nanostructured Images Using EBL, DIP, and ToF-SIMS

Recent advances in nanotechnology have generated great interest, resulting in new fabrication techniques. Following this trend, this chapter explores the combined use of electron beam lithography (EBL), digital image processing (DIP), and time-of-flight secondary ion mass spectrometry (ToF-SIMS) to fabricate and analyze nanostructures. We nanoengraved an image on a silicon chip by EBL and analyzed it microscopically and spectrometrically using light microscopes and a ToF-SIMS instrument. We also used computational methods such as the BRISQUE, Gaussian blur filter, and Canny edge detection algorithm to assess micrograph quality, identify structural defects and edges, and infer the best exposure dose settings for the EBL process, which represents our methodical contribution to this field. Results show that our exposure dosage and analytical techniques are reliable and optimal. Our work demonstrates the artistry and advantages of combining EBL, DIP, and ToF-SIMS for nanofabrication and nanoanalytics, providing insight for future research.