Capacitively Coupled Plasma
Abstract
Characteristics of Capacitively Coupled Plasma (CCP): rf plasma is generally sustained capacitively or inductively. The spatiotemporal plasma property is characterized by external plasma parameters (feed gas and pressure, amplitude and frequency of applied rf voltage, and so on). In particular, structure and function of 2f-CCP will be elucidated.
Fields of Study & Subjects
Low-Pressure Plasma Processing and Diagnostics
Atmospheric-Pressure Plasma Applications
Vacuum and Plasma Arcs
Publication details
- Journal / source
- CRC Press eBooks
- Pages
- 265–288
- Publication date
- 10 March 2026
- Language
- EN
- Document type
- Book chapter