Below 2 nm: Samsung 2 nm GAA, "Angstrom-Class" Branding, and Where ASML Sits in the New Lithography Regime

2026 Open access

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Authors: Douglas C. Youvan
DOI: 10.13140/rg.2.2.34906.40640
Cited by: 0

Fields of Study & Subjects

Advancements in Photolithography Techniques Electronic Packaging and Soldering Technologies Nanofabrication and Lithography Techniques

Publication details

Publication date
1 January 2026