High-performance dual-band silicon slow-light modulator for DWDM chip-scale applications

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Authors: Zanyun Zhang, Hao Jiang, Meixin Li, Qixin Wang, Wenjing Zhang, xiaoqing lv, Kaixin Zhang, Tianjun Liu, Beiju Huang
Cited by: 2
References: 35

Abstract

This paper presents a silicon slow-light modulator based on cascaded phase-shifted Bragg grating (PSBG) structures, which supports C/L dual-band modulation and demonstrates consistent wavelength channel performance across these bands. The modulator has an ultra-compact modulation length of only 201 µm, a normalized insertion loss of 5.3 dB, an electro-optic bandwidth of up to 85 GHz, and an OOK modulation speed of up to 128 Gbaud. Notably, it features a breakthrough in operational bandwidth, with a flat passband exceeding 20 nm in both C and L bands, and achieves an energy efficiency of 0.242 pJ/bit. The design integrates CMOS compatibility, small footprint, low insertion loss, high bandwidth, and extensive working wavelength range, providing an efficient solution for high-density wavelength division multiplexing (DWDM) chip-scale interconnects.

Fields of Study & Subjects

Photonic and Optical Devices Silicon Nanostructures and Photoluminescence Advanced MEMS and NEMS Technologies

Publication details

Journal / source
Optics Express
Publisher
Optica Publishing Group
Volume
34
Issue
3
Pages
3654–3654
Publication date
14 January 2026
Language
EN