Background segmentation and aberration fitting via deep learning for accurate phase correction in digital holographic interferometry

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Authors: Youxing Li, Yaoqing Xie, Lingzhi Meng, Zhiyuan Xu, Kai Zhang, Hongwei Li, Donghui Wang, Libo Yuan
Cited by: 2
References: 25

Abstract

Digital holographic interferometry is a high-precision technique for quantitative imaging and measurement. However, the phase retrieved from interference patterns requires correction to obtain the true object phase. Existing numerical methods typically rely on either assumed prior constraints (as in traditional optimization-based approaches) or accurate correction data labels (as in deep learning-based methods), making it difficult to achieve an optimal balance between improving accuracy and reducing dependence on labelled data. To this end, we propose a joint neural network framework comprising a mask neural network and a phase correction neural network (MNN-PCNN) for joint background segmentation and aberration fitting to achieve phase correction in digital holographic interferometry. Inspired by the masked least-squares polynomial fitting, MNN-PCNN first employs a segmentation-based MNN to separate the pure background regions, thereby eliminating interference from the object. Subsequently, PCNN with embedded Zernike polynomial modes is leveraged to achieve accurate and reliable aberration compensation and noise suppression via self-supervised learning. Both simulation and experimental results demonstrate that the proposed MNN-PCNN outperforms classical polynomial fitting methods as well as the representative UNet. Furthermore, the developed network effectively eliminates phase deviations retrieved across multiple projection angles in digital holographic micro-tomography, which plays a critical role in enhancing the accuracy of quantitative three-dimensional measurements.

Fields of Study & Subjects

Digital Holography and Microscopy Optical measurement and interference techniques Advanced X-ray Imaging Techniques

Publication details

Journal / source
Optics Express
Publisher
Optica Publishing Group
Volume
34
Issue
6
Pages
9994–9994
Publication date
6 March 2026
Language
EN