Seidel-based position-dependent aberration correction in Fourier holography
Abstract
This work presents a framework for modeling, measuring, and correcting position-dependent pupil aberrations in Fourier holography. Aberrations are characterized by six coefficients: four Seidel terms, tip, and tilt. Two efficient diffraction integral approximations are developed: a series expansion for defocus-like aberrations and a patch-based method for the general case. The coefficients are estimated by scanning over a range of values to optimize correction on a grid of target markers. Experiments on a compact Fourier holographic projector demonstrate substantial improvements in image sharpness across the entire field of view.
Fields of Study & Subjects
Digital Holography and Microscopy
Optical measurement and interference techniques
Advanced optical system design
Publication details
- Journal / source
- Optics Express
- Volume
- 34
- Issue
- 5
- Pages
- 8119–8119
- Publication date
- 16 February 2026
- Language
- EN