Polarization-independent selective etching of fused silica glass induced by femtosecond laser pulses in GHz burst mode
Abstract
Polarization-independent ultrafast laser-induced selective etching (ULISE) using GHz femtosecond laser bursts is demonstrated in fused silica. Its performance at various inscription conditions was studied, revealing a high etching speed (>600 µm/h) and a lower nonlinear threshold. Complex 3D microchannel networks and 2D curved microchannels were successfully fabricated. Unlike conventional femtosecond laser pulses that form polarization-dependent nanogratings or sparse nano cracks in the "few-pulse" regime, GHz femtosecond laser bursts generate random micro/nano cracks and eliminate polarization dependence, similar to those induced by picosecond lasers with pulse duration ≥4 ps. This technique offers a new strategy for high-throughput, high-fidelity 3D subtractive manufacturing of brittle glass and crystals.
Fields of Study & Subjects
Laser Material Processing Techniques
Silicon Nanostructures and Photoluminescence
Glass properties and applications
Publication details
- Journal / source
- Optics Express
- Publisher
- Optica Publishing Group
- Volume
- 34
- Issue
- 9
- Pages
- 16193–16193
- Publication date
- 15 April 2026
- Language
- EN