Dataset: Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapour deposition using structured electrode capacitively coupled plasmas

York 2026 Dataset Open access

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Authors: DEDRICK, JAMES PETER
DOI: 10.15124/e0f5da4a-836f-4f56-943b-f65d81964fa5
Cited by: 0

Publication details

Journal / source
York
Publication date
1 January 2026
Document type
Dataset