Advances in the Preparation of Halide Perovskite Thin Films by Pulsed Laser Deposition

Pulsed Laser Deposition (PLD) is a clean and versatile technique for thin film fabrication.This method provides precise control over film thickness and crystalline orientation, while ensuring accurate transfer of chemical stoichiometry.It is commonly used to fabricate various functional thin film materials with complex compositions.Halide perovskite materials have attracted significant attention due to their exceptional optoelectronic properties, leading to remarkable progress in applications such as solar cells, photodetectors, and light-emitting diodes.However, the high defect density in conventional polycrystalline perovskite films severely limits further improvements in device performance.This review systematically summarizes recent progress in preparing halide perovskite thin films via PLD, with a particular focus on epitaxial growth strategies designed to overcome the intrinsic limitations of polycrystalline films.First, the basic principles of PLD and their application in depositing polycrystalline perovskite films are outlined, including process control and device integration.Next, the article concentrates on advanced research in the epitaxial growth of single-crystal perovskite films using PLD.Key issues such as lattice matching, strain engineering, and the construction of low-defect interfaces are discussed, along with strategies for achieving high-quality epitaxy on various substrates.Finally, we analyze the challenges and future directions of PLD for applications in integrated optoelectronics, tandem solar cells, and flexible devices, with the aim of providing assistance and guidance for relevant researchers.