Electromigration and Thermomigration Behavior of Cu Microbumps in Stacked Die Assembly

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Authors: Shubhra Bansal
Cited by: 0

Fields of Study & Subjects

3D IC and TSV technologies Electronic Packaging and Soldering Technologies Copper Interconnects and Reliability

Publication details

Journal / source
IEEE RESOURCE CENTERS
Publication date
3 March 2026
Language
EN