Modeling Pressure and Distance Effects on Particle Transport in PVD Sputtering Using a 3D Monte Carlo Approach

International Journal of Thin Films Science and Technology 2026

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DOI: 10.18576/ijtfst/150106
Cited by: 0

Fields of Study & Subjects

Low-Pressure Plasma Processing and Diagnostics Gas Dynamics and Kinetic Theory Fusion materials and technologies

Publication details

Journal / source
International Journal of Thin Films Science and Technology
Volume
15
Issue
1
Pages
75–81
Publication date
1 January 2026
Language
EN