Precision etching process optimization and mechanism investigation for ultrathin Al2O3 thin films at the bottom of trenches
Fields of Study & Subjects
Plasma Diagnostics and Applications
Copper Interconnects and Reliability
Optical Coatings and Gratings
Publication details
- Journal / source
- SSRN Electronic Journal
- Publication date
- 1 January 2026
- Document type
- Preprint