Atomic Layer Deposition of Hafnium Silicate Thin Films Using a Single Source Precursor

SSRN Electronic Journal 2026 Preprint Open access

Read full text

Authors: Jieun Oh, Seo-Hyun Lee, Jeongbin Lee, Chang Mo Yoon, Daeyeong Kim, Yongjoo Park, Woo‐Hee Kim

DOI: 10.2139/ssrn.6035077

Cited by: 0

References: 12

Fields of Study & Subjects

Semiconductor materials and devices Ferroelectric and Negative Capacitance Devices Semiconductor materials and interfaces

References 12