High-performance DMD maskless lithography system via position and velocity correction and overall pattern uniformity optimization

SSRN Electronic Journal 2026 Preprint Open access

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Authors: Jiaxuan Liu, Tianhang Chen, Jisen Wen, Qianyi Yuan, Xiao Lin, Yuankun Shi, Wenqi Zhuang, Mengdi Luo, Chenyi Su, Cuifang Kuang
DOI: 10.2139/ssrn.6049449
Cited by: 0
References: 29

Fields of Study & Subjects

Metamaterials and Metasurfaces Applications Nanofabrication and Lithography Techniques Advanced optical system design

Publication details

Journal / source
SSRN Electronic Journal
Publication date
1 January 2026
Document type
Preprint