Unveiling the Mechanism of Nitrogen Plasma Activated Dielectric Oxides for Low Temperature Wafer-to-Wafer Bonding
Fields of Study & Subjects
3D IC and TSV technologies
Copper Interconnects and Reliability
Electronic Packaging and Soldering Technologies
Publication details
- Journal / source
- SSRN Electronic Journal
- Publication date
- 1 January 2026
- Document type
- Preprint