High-Purity and Oxygen-Free MgF2 Thin Films by Newly Designed Plasma-Enhanced Atomic Layer Deposition

SSRN Electronic Journal 2026 Preprint Open access

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Authors: Zhi-Xuan Zhang, Xiao Lin, J. M. Zhang, Wen-Xuan Zhu, Peng Gao, Yu Qiu, Chia‐Hsun Hsu, Zhi-Xian Lin, Shui-Yang Lien, Chen Wang, Wan-Yu Wu, Dong‐Sing Wuu
DOI: 10.2139/ssrn.6056398
Cited by: 0
References: 19

Fields of Study & Subjects

Optical Coatings and Gratings Semiconductor materials and devices Plasma Diagnostics and Applications

Publication details

Journal / source
SSRN Electronic Journal
Publication date
1 January 2026
Document type
Preprint