Engineering frustrated Lewis pairs on graphitic carbon nitride for efficient photocatalytic degradation and detoxification of tetracycline

Read full text
Authors: Yao Xiao, Liberty L. Mguni, Yashi Chen, Xiao Xu, Ziying Sun, Zhiyan He, Shan Wang, Sónia A.C. Carabineiro, Yali Yao, Junjiang Zhu
Cited by: 3
References: 39

Abstract

Abstract Heterogeneous photocatalysis is a promising advanced oxidation process for the removal of organic pollutants, yet its efficiency is often limited by thermodynamic barriers and insufficient pollutant activation. Herein, we report the construction of frustrated Lewis pairs (FLPs) on graphitic carbon nitride (CN) to address these challenges and achieve enhanced photocatalytic degradation of tetracycline (TC). FLPs are introduced by an alkalization treatment, which introduces carbon vacancies (CVs) as Lewis acid (LA) sites and adjacent surface hydroxyl groups as Lewis base (LB) sites. This unique dual-sites configuration markedly improves charge separation, optimizes the band structure, and enhances the redox potential of CN. Furthermore, the synergistic “push–pull” electron effect of FLPs enables efficient activation of TC molecules, facilitating rapid oxidation by photogenerated holes. As a result, the optimized catalyst (CN-OH-15) achieves a degradation rate constant of 0.045 min−1, nearly four times higher than pristine CN. Mechanistic studies reveal that the degradation pathway proceeds through demethylation, decarbonylation and ring-opening reactions, effectively reducing the toxicity of intermediates and creating a favorable basis for integration with biological treatment. This study demonstrates FLP engineering as a powerful strategy for pollutant activation and to regulate degradation pathways for sustainable wastewater remediation.

Fields of Study & Subjects

Advanced Photocatalysis Techniques Covalent Organic Framework Applications Advanced oxidation water treatment

Publication details

Journal / source
Nano Research
Publisher
Tsinghua University Press
Volume
19
Issue
5
Pages
94908399–94908399
Publication date
5 January 2026
Language
EN