A non-destructive tomographic depth profiling framework for high-precision interface analysis

Abstract Non-destructive, depth-resolved characterization is crucial for revealing the evolution of interfacial electronic structures in energy materials and catalytic systems. To overcome the limitations of conventional approaches, which often damage samples and fail to capture true interfacial information, we have established a synchrotron-based platform for non-destructive tomography depth profiling (NDTDP) at the BL10B beamline of Hefei Light Source II. This platform integrates energy- and angle-tunable synchrotron radiation photoelectron spectroscopy with multi-mode soft X-ray absorption spectroscopy, enabling continuous depth profiling from the outermost surface to near-bulk regions. Using single-crystal Si and Cu2O powders as model systems, we systematically validated the platform’s ability to resolve surface oxidation and valence-state gradients, demonstrating high depth resolution and consistency across measurements. These findings establish BL10B as a reliable, NDTDP platform for probing complex interfacial electronic structures and conducting in situ studies.