The additive forming of copper shunting elements on low-resistance permalloy
Abstract
It was studied the process of microgalvanic Cu shunting strips forming from the electrolyte based on aqueous solute of copper glycinate directly on Ni81Fe19 magnetoresistive structures. The characteristics height of formed elements is 3 mkm with the gap between neighbor elements ≈ 800 nm. Conditions for shunting elements aspect ratio increasing in frame of Dukovic’s current distribution model and problems of deposit’s crystal habitus controlling is analyzed.
Fields of Study & Subjects
Electrodeposition and Electroless Coatings
Anodic Oxide Films and Nanostructures
Additive Manufacturing Materials and Processes
Publication details
- Journal / source
- Perspektivnye Materialy
- Issue
- 1
- Pages
- 27–33
- Publication date
- 1 January 2026