Effect of Orifice Layout on Low Frequency Oscillation Flow in Jet Condensation System

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Authors: Chengfeng Zhu, Yanzhong Li, Lei Wang, Fushou Xie
Cited by: 0

Abstract

Low-frequency oscillatory flow is a long-standing instability in cryogenic jet condensation systems and is closely associated with abnormal pressure fluctuations in propulsion pipelines. While previous studies mainly focused on operating conditions, the role of injector orifice layout in triggering low-frequency oscillations remains unclear. In this work, a three-dimensional numerical investigation was conducted to examine the effect of orifice layout on condensation-induced oscillatory flow in an oxygen jet condensation system. A curvature-coupled mass transfer model is employed, in which the interfacial mass transfer rate is dynamically linked to local vapor–liquid interfacial curvature, enabling accurate representation of interfacial evolution. A series of numerical cases are designed by varying the number, arrangement, and diameter of orifices under different combinations of mass rate, mass flux, and total injection area. Two distinct condensation patterns are identified: suck-back chugging and weak pulsation. Pronounced low-frequency oscillations are observed only for specific orifice layouts. When the total injection area and gaseous oxygen mass rate are maintained, chugging persists under different layouts, producing dominant frequencies of approximately 10~11 Hz and pressure amplitudes of about 80~120 kPa. Once either the total area or mass rate is altered, the system transitions to weak pulsation with pressure fluctuations below 3 kPa. These results demonstrate that low-frequency oscillatory flow is a layout-enabled instability rather than a mass-flux-controlled phenomenon, highlighting the importance of injector geometric design in regulating condensation-induced oscillations.

Fields of Study & Subjects

Nuclear Engineering Thermal-Hydraulics Heat Transfer and Boiling Studies Spacecraft and Cryogenic Technologies

Publication details

Journal / source
Processes
Volume
14
Issue
4
Pages
658–658
Publication date
14 February 2026
Language
EN