Plasma–enhanced chemical vapor deposition of Co3O4 thin films as a new approach for improving oxygen evolution activity

Dataset for the publication Plasma–enhanced chemical vapor deposition of Co3O4 thin films as a new approach for improving oxygen evolution activity. Dominik Knozowski, Aleksandra Kędzierska-Sar, Robert Ranecki, Piotr Kuswik,Maciej Fronczak, Stanisław Gierlotka, Sebastian Arabasz, Amil Aligayev, Ulkar Jabbarli, Francisco Javier Dominguez–Gutierrez, Marta Gmurek https://doi.org/10.1016/j.cattod.2025.115374 This work was financially supported by a grant from the National Center of Science (NCN) in Krakow within the Sonata Grant Program (2020/39/D/ST8/00384).