BSIM4 modeling of drain voltage, gate length, and temperature-dependent I d – V g characteristics of bulk MOSFETs at cryogenic temperature using a conditional diffusion neural network

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Authors: Takumi Inaba, Hiroshi Fuketa, Hiroshi Oka, Yusuke Chiashi, Hidehiro Asai, Shota Iizuka, Kimihiko Kato, Takahiro Mori
Cited by: 0
References: 34

Abstract

Abstract In this study, a neural-network-based approach was developed to model the drain-voltage, gate-length, and temperature-dependent drain-current–gate-voltage ( I d – V g ) characteristics of metal-oxide-semiconductor field-effect transistors (MOSFETs) at cryogenic temperatures. Using experimental data obtained at cryogenic temperatures, fifteen BSIM4 parameters were automatically tuned through this approach. As a result, a single set of BSIM4 parameters was extracted that reproduced the I d – V g characteristics of short-channel bulk MOSFETs with gate lengths of 90–250 nm over the temperature range of 4–100 K. These results contribute to continuity and convergence in Cryo-CMOS circuit simulations under self-heating effects, facilitating precise qubit control and the realization of large-scale fault-tolerant quantum computers.

Fields of Study & Subjects

Advancements in Semiconductor Devices and Circuit Design Semiconductor materials and devices Low-power high-performance VLSI design

Publication details

Journal / source
Japanese Journal of Applied Physics
Volume
65
Issue
4
Pages
044001–044001
Publication date
6 February 2026