Extremely small trap concentrations in high-purity n-type GaN grown by quartz-free hydride vapor phase epitaxy
Abstract
Abstract Trap characterization was performed for n-type GaN grown by the quartz-free hydride vapor phase epitaxy method with a newly developed reactor. Deep-level transient spectroscopy revealed several electron and hole traps within 1 eV of the conduction and valence band edges. All were present at low concentrations (∼5 × 10 13 cm −3 ). The concentrations of other traps near the mid-gap region were estimated to be below 1 × 10 13 cm −3 for donor-type traps and below 5 × 10 13 cm −3 for acceptor-type traps. These results demonstrate that the new reactor enables the growth of high-purity GaN with extremely small trap concentrations.
Fields of Study & Subjects
GaN-based semiconductor devices and materials
Silicon Carbide Semiconductor Technologies
Semiconductor materials and interfaces
Publication details
- Journal / source
- Applied Physics Express
- Volume
- 19
- Issue
- 2
- Pages
- 021012–021012
- Publication date
- 1 February 2026
- Language
- EN