深紫外光刻用Al2O3和AlF3薄膜在不同基底上的力学特性量化分析（特邀）

Acta Optica Sinica (Online) 2026

View at publisher
Authors: 李建 Li Jian, 王蒙雷 Wang Menglei, 周璟超 Zhou Jingchao, 王焜 Wang Kun, 刘淏 Liu Hao, 谢明辰 Xie Mingchen, 蔡轩皓 Cai Xuanhao, 张伟丽 Zhang Weili, 邵宇川 Shao Yuchuan
DOI: 10.3788/aosol250554
Cited by: 0
References: 20

Fields of Study & Subjects

Metal and Thin Film Mechanics Optical Coatings and Gratings Advancements in Photolithography Techniques

Publication details

Journal / source
Acta Optica Sinica (Online)
Volume
3
Issue
3
Pages
0301004–0301004
Publication date
1 January 2026
Language
EN