A low-toxicity ammonium hydrogen fluoride-based etchant for bonding pretreatment of silica-based CAD-CAM materials

Dental Materials Journal 2026 Open access

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Authors: Ayako Miura, Yuya Komagata, Yuki Nagamatsu, Chihiro Masaki, Hiroshi Ikeda

DOI: 10.4012/dmj.2025-323

Cited by: 1

References: 45

Abstract

values comparable to those of phosphoric acid and sodium fluoride.

3D IC and TSV technologies Nanofabrication and Lithography Techniques Advanced Surface Polishing Techniques

References 45