High-Throughput Sub-2nm Lithography via Femtosecond Photon-to-Electron Projection using Graphene Membranes

Zenodo (CERN European Organization for Nuclear Research) 2026 Preprint Open access

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Authors: Pirolo Andres Sebastian
DOI: 10.5281/zenodo.18137688
Cited by: 0

Abstract

We propose a novel hybrid lithography architecture designed to overcome the throughput limitations of Electron Beam Lithography (EBL) and the cost complexity of High-NA EUV at the 2 nm node. The system utilizes a femtosecond photon-to-electron projection mechanism, coupling a Ti:Sapphire laser (

Fields of Study & Subjects

Advancements in Photolithography Techniques Integrated Circuits and Semiconductor Failure Analysis Molecular Junctions and Nanostructures

Publication details

Journal / source
Zenodo (CERN European Organization for Nuclear Research)
Publication date
3 January 2026
Document type
Preprint