Effect of Crystalline Phase on the Thermal Atomic Layer Etching of Aluminum Oxide: A First-Principles Study
Abstract
Coordinate data set from the DFT calculations of the atomic layer etching reactions.
Fields of Study & Subjects
Semiconductor materials and devices
Low-Pressure Plasma Processing and Diagnostics
Advancements in Photolithography Techniques
Publication details
- Journal / source
- Zenodo (CERN European Organization for Nuclear Research)
- Publication date
- 6 March 2026
- Language
- EN
- Document type
- Dataset