Effect of Crystalline Phase on the Thermal Atomic Layer Etching of Aluminum Oxide: A First-Principles Study

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Authors: Muhammad Hasbi Ar-Raihan, Khabib Khumaini, Hye-Lee Kim, Taewook Nam, Won-Jun Lee
Cited by: 0

Abstract

Coordinate data set from the DFT calculations of the atomic layer etching reactions.

Fields of Study & Subjects

Semiconductor materials and devices Low-Pressure Plasma Processing and Diagnostics Advancements in Photolithography Techniques

Publication details

Journal / source
Zenodo (CERN European Organization for Nuclear Research)
Publication date
6 March 2026
Language
EN
Document type
Dataset