Design and Verification of SRAM Using GPDK using 45nm Technology

Read full text
Authors: Akshata Kitturkar1*, Arifa Donsal1, Aishwarya Daddi1, Akshata Arawal1, Rajeshwari P.2,, Rajeshwari P., Akshata Kitturkar, Arifa Donsal, Aishwarya Daddi, Akshata Arawal
Cited by: 0

Abstract

Highlights: · Presents a complete design and verification methodology for SRAM cells using GPDK 45 nm technology in Cadence Virtuoso. · Explains the transistor-level operation of the SRAM cell, verifying MOSFET functionality during read, write, and hold modes. · Performs schematic design, layout implementation, and post-layout verification including DRC and LVS checks. · Analyzes key performance parameters such as static noise margin (SNM), power consumption, access delay, and leakage current. · Validates the correctness and reliability of the SRAM design through pre-layout and post-layout simulations under 45 nm process constraints.

Fields of Study & Subjects

Low-power high-performance VLSI design Physical Unclonable Functions (PUFs) and Hardware Security Radiation Effects in Electronics

Publication details

Journal / source
INTERANTIONAL JOURNAL OF SCIENTIFIC RESEARCH IN ENGINEERING AND MANAGEMENT
Volume
10
Issue
01
Pages
1–9
Publication date
3 January 2026