Xe-LPP EUV source

ScienceDB 2026 Dataset Open access

Read full text
Authors: 姚奕弛
DOI: 10.57760/sciencedb.36163
Cited by: 0

Abstract

本数据集涉及所开发的Xe-LPP EUV光源的强度、等离子体尺寸、稳定性。调节的参数包括气体背压，激光时间延迟以及喷嘴的移动距离。所展示的数据可能存在误差，原因是手动调节减压阀带来的背压误差以及实验的随机性。

Fields of Study & Subjects

Advancements in Photolithography Techniques Plasma Diagnostics and Applications Laser-Plasma Interactions and Diagnostics

Publication details

Journal / source
ScienceDB
Publication date
23 January 2026
Language
ZH
Document type
Dataset