Characterization of the physical and morphological properties of cu₂o films obtained by magnetron sputtering

Nanometric Cu₂O films were fabricated by reactive magnetron RF sputtering and presented as promising materials for use as electron‐ and hole‐transport layers in various solar cell architectures. This study investigates the films' optical and topographical properties, their wetting behavior, as well as the effects of post-deposition thermal treatment. AFM analysis showed an increase in roughness with increasing film thickness from 100 - 340 nm, while contact angle measurements demonstrated enhanced hydrophobicity, with values rising from 102° to 120°. Thermal treatment at 400 °C for 60 minutes in high vacuum (~10⁻⁴ Torr) further intensified the hydrophobic character. Raman spectra revealed phonon modes characteristic of the Cu₂O phase at 218 cm⁻¹, 416 cm⁻¹, and 637 cm⁻¹, confirming the structural composition also identified by X-ray diffraction. Optimizing thickness and structural properties may lead to improvements in the electrical and optoelectronic performance of the films