Seidel-based position-dependent aberration correction in Fourier holography

This work presents a framework for modeling, measuring, and correcting position9 dependent pupil aberrations in Fourier holography. Aberrations are characterized by six coefficients: four Seidel terms, tip, and tilt. Two efficient diffraction integral approximations are developed: a series expansion for defocus-like aberrations and a patch-based method for the general case. The coefficients are estimated by scanning over a range of values to optimize correction on a grid of target markers. Experiments on a compact Fourier holographic projector demonstrate substantial improvements in image sharpness across the entire field of view.