Supplementary Material

AIP Publishing 2026 Open access

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Authors: G. S. Cho, Jehwan Hong, Hye-Lee Kim, Byungchul Cho, Changkyu Lee, Juhwan Park, Won-Jun Lee
DOI: 10.60893/figshare.jva.30871883
Cited by: 0

Abstract

XPS Analysis of an NF3 Remote Plasma-Treated HfO2 Film

Publication details

Journal / source
AIP Publishing
Publication date
1 January 2026