Supplementary material

AIP Publishing 2026 Open access

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Authors: Arthur De Jong, Marc J. M. Merkx, W.M.M. (Erwin) Kessels, Adriaan J. M. Mackus
DOI: 10.60893/figshare.jva.31100749
Cited by: 0

Abstract

Contains the measurements of the ion distribution functions of the plasmas used in this work, the quality of the grown SiO2, and a detailed description of the brute-force algorithm.

Fields of Study & Subjects

Plasma Diagnostics and Applications Dust and Plasma Wave Phenomena Semiconductor materials and devices

Publication details

Journal / source
AIP Publishing
Publication date
1 January 2026
Language
EN