Supplemental Material

AIP Publishing 2026 Open access

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Authors: Devin Brown
DOI: 10.60893/figshare.jvb.30693749.v1
Cited by: 0

Abstract

Detailed process flow, ellipsometry analysis of the index of refraction, and extended SEM images and analysis for the line and dot patterns exposed in 5k MW PAA films.

Publication details

Journal / source
AIP Publishing
Publication date
1 January 2026