Direct Ink Writing of Tungsten Planar Patterns by Extrusion-based Dispensing System

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Authors: M K Lee, Sejin Choi, Jae-Wook Yu, J K Park, Hyuk-Chun Kwon, Ho-Chang Lee, Seong-Uk Oh, Seung-Gon Choi, In-Gu Choi, Gil-Yong Lee
Cited by: 0
References: 25

Abstract

We present an extrusion-based dispensing system designed for the planar patterning of tungsten ink through direct ink writing. This system achieves uniform ink deposition by precisely controlling the dispensing pressure and the motion of the substrate along predefined writing paths. To assess the impact of pressure on pattern geometry, we fabricated line patterns under various pressure conditions and analyzed their widths and thicknesses. To gain further control over pattern width, we employed an adjacent line overlapping strategy, where several lines, each approximately 200 μm wide, were written with partial overlap. We quantitatively verified the relationship between the number of adjacent lines and the resulting pattern width. This method was also adapted to create planar patterns with complex geometries, including variable widths, curved paths, and discontinuous features. The resulting patterns demonstrated uniform quality and precision. These findings confirm that our proposed system provides a versatile solution for fabricating planar conductive patterns with intricate geometries, suitable for applications in printed electronics and interconnects.

Fields of Study & Subjects

Nanomaterials and Printing Technologies Nanofabrication and Lithography Techniques Advanced Materials and Mechanics

Publication details

Journal / source
Journal of the Korean Society for Precision Engineering
Volume
43
Issue
1
Pages
91–97
Publication date
1 January 2026
Language
EN