MEMSデバイス作製のための 電解めっき膜制御に向けたパターン密度の検討

Tokyo Tech Research Repository (Tokyo Institute of Technology) 2026

Authors: 坂梨 航太, 栗岡 智行, Tomoyuki Kurioka, Katsuyuki Machida, Chen Chun-Yi, Chun Yi Chen, Chang Tso-Fu Mark, Tso-Fu Mark Chang, 三宅 美博, Yoshihiro Miyake, 伊藤 浩之, Hiroyuki Ito
+1 more Masato Sone
Cited by: 0

Fields of Study & Subjects

Advanced MEMS and NEMS Technologies Electrodeposition and Electroless Coatings Advancements in Photolithography Techniques

Publication details

Journal / source
Tokyo Tech Research Repository (Tokyo Institute of Technology)
Publication date
24 February 2026
Language
JA